Dual-Beam | FIB Cross-section | SEM | EDS




FIB Cross-Section | Dual-Beam FIB-SEM | TEM Lamella Preparation | EDS

High-Resolution Microscopy & Materials Characterization

Precision Site-Specific Microscopy & Surface Analysis

Advanced Circuit Engineers (ACE) provides premier Dual-Beam FIB-SEM services for advanced materials and engineering research. Utilizing the Helios Nanolab 660, we deliver high-fidelity structural characterization and site-specific sample preparation to help our partners solve complex failure analysis and material validation challenges.

Structural Diagnostics & Material Engineering

Our Dual-Beam synergy enables High-Resolution SEM Surface Imaging and precision ion milling. This capability is essential for exposing buried interfaces, localized subsurface features, and multi-layer thin-film stacks with the clarity required for modern materials diagnostics. By integrating In-Situ Gas Injection, we ensure surface protection and precise marking for every sample project.

To support diverse analytical needs, ACE offers Site-Specific Subsurface Profiling across a variety of industrial substrates. Our large-format vacuum chamber accommodates full wafers up to 200mm as well as industrial metallurgical mounts, ensuring that from microscopic components to bulk materials, your data remains accurate and actionable.

Analytical Services

  • Precision TEM Lamella Preparation
  • Site-Specific FIB Cross-Sectioning
  • High-Contrast Material Interface Imaging
  • Top-Down & Tilt-View SEM Analysis
Advanced Characterization

  • Integrated Bruker Quantax EDS Mapping
  • Elemental Line Scans & Point Analysis
  • Multi-Detector Signal Acquisition (SE/BSE)
  • Surface Particle ID & Morphology

Service Agility

  • Engineering on Demand: Priority Access
  • Direct Engineer-to-Engineer Workflow
  • Standardized Rapid Turnaround
  • Secure Chain-of-Custody Protocols

Data Fidelity

  • High-Resolution Structural Imaging
  • Precision Engineering Data
  • Quantifiable EDS Mapping
  • ITAR-Compliant Data Management

Technical Partnership

  • Live Remote Session Capability
  • Custom Analytical Method Development
  • Consultative Post-Analysis Support
  • Materials R&D and Process Support

FIB Cross section Lamella prep Nanolab 660
ACE SEM EDS

Helios Nanolab 660 Configuration

  • High-Resolution SEM: SE and BSE imaging modes for optimal topographical and compositional contrast.

  • Large-Format Vacuum Chamber: Seamless handling of full wafers up to 200mm and industrial mounts.

  • Bruker Quantax EDS: High-speed elemental mapping and quantitative analysis for chemical identification.

  • Advanced Lamella Extraction: Targeted site-specific sample preparation for subsequent TEM analysis.

  • Protective GIS Deposition: Precision platinum and carbon deposition for sample preservation and marking.

  • Site-Specific Cross-Sectioning: Subsurface profiling to reveal interfaces, grain boundaries, and defects.

Dualbeam | FIB Cross-Section Gallery